TITANIUM ETCHANT TFT
Selective and controllable etchant for application in semiconductor fabrication and thin film microeletronics technology.
Titanium Etchant TFT is designed for etching evaporated films commonly employed as bonding and varrier layers in microelectronics. Excellent resolution, photoresist compatibility, and minimal undercutting are readily achieved.
COMPATIBILITY :
| Al | Au | Cr | Cu | Ni | Si | Si3N4 | SiO2 | Ti | W | GaAs | Ta/TaN |
Ti ETCH TFT | Etch | Ok | Etch | Ok | Ok | Ok | Etch | Etch | Etch | Ok | Etch | Ok |
Etch = significant attack / Slight = Slight attack / Ok = No Attack / Surf ox = Surface Oxidation /
Corrode = Surface Corrosion
Selectivity of about 10:1 for "slight" and selectivity > 1000:1 for "ok" or "no attack"
PROPERTIES :
| Titanium Etchant TFT
| |
Appearance | Clear Aqueous |
Operating Temperature | 20 ~ 50¡É |
Metallization | -------- |
Resist Compatibility | Nega & Posi |
Tank | Polyethylene / Polypropylene |
Etch Rate @ 20¡É | 25 ¡Ê/sec |
Etch Rate @ 30¡É | 50 ¡Ê/sec |
Shelf Life | 1 Year |
Toxicity | Strong Acid |
Flash Point | Non-Flammable |
• Storage : Room Temperature.