TANTALUM ETCHANTS SIE-8607
Transene Tantalum Etchants SIE-8607 is high purity etchant systems for precise, clean etching of tantalum, tantalum nitride, and tantalum oxide thin films and resists in electronics applications. Tantalum Etchant SIE-8607 is a more aggressive etchant for faster etch rates. SIE-8607 is filtered to remove all particulates above 0.2 microns.
PROPERTIES :
| Tantalum Etch SIE-8607 | |
Appearance | Clear |
Solubility | Infinite in water |
Filtration | 0.2 microns |
Operation | 25 ¡É |
Etch Rate (Ta) @ 25¡É | 70-80 ¡Ê/sec |
Storage | Room Temperature |
Shelf Life | 1 Year |
Mask Materials | Gold; Positive or Negative |
Rinse | Deionized Water |
APPLICATION:
Etch times vary depending on material type (Ta, TaN, or Ta2O5) and purity. Parts to be etched should be placed in etchant solution with mild to moderate mechanical agitation. Tantalum Etchants contain hydrofluoric acid and will attack silicon oxides, titanium, nickel, aluminum, and chromium.